TiN and TiZrV Thin Film as a Remedy Against Electron Cloud

In many accelerators running positively charged beams, ionization of residual gas and secondary electron emission in the beam pipe will give rise to an electron cloud which can cause beam blow-up or the loss of the circulating beam. One solution to avoid the electron cloud is to ensure that the vacuum wall has low secondary emission yield (SEY). The SEY of thin films of TiN and sputter-deposited non-evaporable getter were measured for a variety of conditions, including the effect of recontamination in an ultra high vacuum environment. Submitted to the journal Nuclear Instruments and Methods in Physics Research : A ∗Work supported by Department of Energy under contracts DE-AC02-76SF00515. [email protected]. TiN and TiZrV Thin Film as a Remedy Against Electron Cloud F. Le Pimpec, R.E Kirby 1, F.King, M.Pivi SLAC, 2575 Sand Hill Road Menlo Park CA 94025 , USA Abstract In many accelerators running positively charged beams, ionization of residual gas and secondary electron emission in the beam pipe will give rise to an electron cloud which can cause beam blow-up or the loss of the circulating beam. One solution to avoid the electron cloud is to ensure that the vacuum wall has low secondary emission yield (SEY). The SEY of thin films of TiN and sputter-deposited nonevaporable getter were measured for a variety of conditions, including the effect of recontamination in an ultra high vacuum environment.In many accelerators running positively charged beams, ionization of residual gas and secondary electron emission in the beam pipe will give rise to an electron cloud which can cause beam blow-up or the loss of the circulating beam. One solution to avoid the electron cloud is to ensure that the vacuum wall has low secondary emission yield (SEY). The SEY of thin films of TiN and sputter-deposited nonevaporable getter were measured for a variety of conditions, including the effect of recontamination in an ultra high vacuum environment.